Dome cooling using compliant material

ABSTRACT

Embodiments described herein generally relate to apparatus for processing substrates. The apparatus generally include a process chamber including a lamp housing containing lamps positioned adjacent to an optically transparent window. Lamps within the lamp housing provide radiant energy to a substrate positioned on the substrate support. Temperature control of the optically transparent window is facilitated using cooling channels within the lamp housing. The lamp housing is thermally coupled to the optically transparent window using compliant conductors. The compliant conductors maintain a uniform conduction length irrespective of machining tolerances of the optically transparent window and the lamp housing. The uniform conduction length promotes accurate temperature control. Because the length of the compliant conductors is uniform irrespective of machining tolerances of chamber components, the conduction length is the same for different process chambers. Thus, temperature control amongst multiple process chambers is uniform, reducing chamber-to-chamber variation.

CROSS-REFERENCE TO RELATED APPLICATIONS

This application is a continuation application of U.S. patentapplication Ser. No. 14/254,568, filed Apr. 16, 2014, which claimsbenefit of U.S. Provisional Patent Application Ser. No. 62/821,804,filed May 10, 2013, which is herein incorporated by reference.

BACKGROUND OF THE DISCLOSURE Field of the Disclosure

Embodiments of the present disclosure generally relate to apparatus forheating substrates, such as semiconductor substrates.

Description of the Related Art

Semiconductor substrates are processed for a wide variety ofapplications, including the fabrication of integrated devices andmicrodevices. One method of processing substrates includes depositing amaterial, for example, an epitaxial material, on a substrate surface.Deposited film quality is dependent upon several factors, includingprocess conditions such as temperature. As transistor size decreases,temperature control becomes more important in forming high qualityfilms. Additionally or alternatively, deposited materials may bethermally treated, for example annealed, after deposition on asubstrate. Consistent temperature control during deposition or thermaltreatment results in process-to-process repeatability.

However, each processing chamber utilized to process substrates hasslight variations from other chambers, particularly due to machiningtolerances of the individual components of each chamber. Thus, eachindividual chamber has different characteristics during a thermalprocess, for example, different cooling rates or chamber hot spots,resulting in substrates processed in different chambers having differentproperties (e.g., chamber-to-chamber variation). The variation betweensubstrates processed on different chambers is amplified as transistordevice decreases. Thus, substrates processed on a first chamber willhave different properties than substrates processed on other chambers,even though the same processing recipe was used on all the chambers.

Therefore, there is a need for an apparatus that reduceschamber-to-chamber variation of processed substrates.

SUMMARY OF THE DISCLOSURE

Embodiments described herein generally relate to apparatus forprocessing substrates. The apparatus generally include a process chamberincluding a lamp housing containing lamps positioned adjacent to anoptically transparent window. Lamps within the lamp housing provideradiant energy to a substrate positioned on the substrate support.Temperature control of the optically transparent window is facilitatedusing cooling channels within the lamp housing. The lamp housing isthermally coupled to the optically transparent window using compliantconductors. The compliant conductors maintain a uniform conductionlength irrespective of machining tolerances of the optically transparentwindow and the lamp housing. The uniform conduction length promotesaccurate temperature control. Because the length of the compliantconductors is uniform irrespective of machining tolerances of chambercomponents, the conduction length is the same for different processchambers. Thus, temperature control amongst multiple process chambers isuniform, reducing chamber-to-chamber variation.

In one embodiment, a process chamber comprises a chamber body includingan optically transparent window and a lamp housing disposed adjacent tothe optically transparent window. The optically transparent window andthe lamp housing having a gap therebetween and one or more coolingchannels are disposed within the lamp housing. A plurality of compliantconductors are disposed within the gap between the lamp housing andtransparent window. The compliant conductors are in contact with thelamp housing and transparent window.

In another embodiment, a process chamber comprises a chamber bodyincluding an optically transparent window and a lamp housing disposedadjacent to the optically transparent window. The optically transparentwindow and the lamp housing having a gap therebetween. One or morecooling channels are disposed within the lamp housing. The processchamber also includes a plurality of compliant conductors disposedwithin the gap between the lamp housing and transparent window and incontact with the lamp housing and transparent window. The compliantconductors may include mesh or wool.

In another embodiment, a process chamber comprises a chamber bodyincluding an optically transparent window, and a lamp housing disposedadjacent to the optically transparent window. The optically transparentwindow and the lamp housing include a gap therebetween. One or morecooling channels are disposed within the lamp housing. The processchamber also includes a plurality of compliant conductors disposedwithin the gap between the lamp housing and transparent window and incontact with the lamp housing and transparent window. The compliantconductors include a coating on an end thereof in contact with thetransparent window.

BRIEF DESCRIPTION OF THE DRAWINGS

So that the manner in which the above recited features of the presentdisclosure can be understood in detail, a more particular description ofthe disclosure, briefly summarized above, may be had by reference toembodiments, some of which are illustrated in the appended drawings. Itis to be noted, however, that the appended drawings illustrate onlytypical embodiments of this disclosure and are therefore not to beconsidered limiting of its scope, for the disclosure may admit to otherequally effective embodiments.

FIG. 1 is a schematic sectional view of a process chamber according toone embodiment of the disclosure.

FIG. 2 is an enlarged partial view of FIG. 1 illustrating compliantconductors.

FIG. 3 is a partial sectional schematic view of a lamp housing,according to one embodiment of the disclosure.

FIGS. 4A-4D illustrate compliant conductors according to otherembodiments of the disclosure.

To facilitate understanding, identical reference numerals have beenused, where possible, to designate identical elements that are common tothe figures. It is contemplated that elements and features of oneembodiment may be beneficially incorporated in other embodiments withoutfurther recitation.

DETAILED DESCRIPTION

Embodiments described herein generally relate to apparatus forprocessing substrates. The apparatus generally include a process chamberincluding a lamp housing containing lamps positioned adjacent to anoptically transparent window. Lamps within the lamp housing provideradiant energy to a substrate positioned on the substrate support.Temperature control of the optically transparent window is facilitatedusing cooling channels within the lamp housing. The lamp housing isthermally coupled to the optically transparent window using compliantconductors. The compliant conductors maintain a uniform conductionlength irrespective of machining tolerances of the optically transparentwindow and the lamp housing. The uniform conduction length promotesaccurate temperature control. Because the length of the compliantconductors is uniform irrespective of machining tolerances of chambercomponents, the conduction length is the same for different processchambers. Thus, temperature control amongst multiple process chambers isuniform, reducing chamber-to-chamber variation.

FIG. 1 is a schematic sectional view of a process chamber 100 accordingto one embodiment of the disclosure. The process chamber 100 may be usedto process one or more substrates, including the deposition of amaterial on an upper surface of a substrate. The process chamber 100includes a chamber body 101, an upper window 102, such as a dome, formedfrom a material such as a stainless steel, aluminum, ceramics (e.g.,quartz), or coated metals or ceramics. The process chamber 100 alsoincludes a lower window 104, such as a dome, formed from an opticallytransparent material such as quartz. The lower window 104 is coupled to,or is an integral part of, the chamber body 101. A substrate support 106adapted to support a substrate 108 thereon is disposed within theprocess chamber 100 between the upper window 102 and the lower window104. The substrate support 106 is coupled to a support plate 109 andforms a gap 111 therebetween. The support plate 109 is formed from anoptically transparent material, such as quartz, to allow radiant energyfrom lamps 142 to impinge upon and heat the substrate support 106 to adesired processing temperature. The substrate support 106 is formed fromsilicon carbide or graphite coated with silicon carbide to absorbradiant energy from the lamps 142 and transfer the radiant energy to thesubstrate 108.

The substrate support 106 is shown in an elevated processing position,but may be vertically actuated by an actuator 112 to a loading positionbelow the processing position to allow lift pins 110 to contact thelower window 104 and raise the substrate 108 from the substrate support106. A robot (not shown) may then enter the process chamber 100 toengage and remove the substrate 108 therefrom through an opening 114,such as a slit valve. The substrate support 106 is also adapted to berotated during processing by the actuator 112 to facilitate uniformprocessing of the substrate 108.

The substrate support 106, while located in the processing position,divides the internal volume of the process chamber 100 into a processgas region 116 and a purge gas region 118. The process gas region 116includes the internal chamber volume located between the upper window102 and a plane 120 of the substrate support 106 while the substratesupport 106 is located in the processing position. The purge gas region118 includes the internal chamber volume located between the lowerwindow 104 and the plane 120.

Purge gas supplied from a purge gas source 122 is introduced to thepurge gas region 118 through a purge gas inlet 124 formed within asidewall of the chamber body 101. The purge gas flows laterally alongflow path 126 across the back surface of the support 106, and isexhausted from the purge gas region 118 through a purge gas outlet 128located on the opposite side of the process chamber 100 as the purge gasinlet 124. An exhaust pump 130, coupled to the purge gas outlet 128,facilitates removal of the purge gas from the purge gas region 118.

Process gas supplied from a process gas supply source 132 is introducedinto the process gas region 116 through a process gas inlet 134 formedin a sidewall of the chamber body 101. The process gas flows laterallyacross the upper surface of the substrate 108 along flow path 136. Theprocess gas exits the process gas region 116 through a process gasoutlet 138 located on the opposite side of the process chamber 100 asthe process gas inlet 134. Removal of the process gas through theprocess gas outlet 138 is facilitated by a vacuum pump 140 coupledthereto.

Multiple lamps 142 are disposed adjacent to and beneath the lower window104 to heat the substrate 108 as the process gas passes thereover tofacilitate the deposition of a material onto the upper surface of thesubstrate 108. The lamps 142 are positioned in a lamp housing 150,formed from, for example, copper, aluminum, or stainless steel. Thelamps include bulbs 141 surrounded by an optional reflector 143. Eachlamp 142 is coupled to a power distribution board 147 through whichpower is supplied to each lamp 142. The lamps 142 are arranged inannular groups of increasing radius around a shaft 127 of the substratesupport 106. The shaft 127 is formed form quartz or another opticallytransparent material.

An upper surface of the lamp housing 150 is positioned in a spaced apartorientation from the lower window 104 to form a gap 151 therebetween. Inone example, the gap 151 may be about 0.5 millimeters to about 10millimeters, or more. In one example, the gap 151 is about 6millimeters. Thermal energy is transferred from the lower window 104 tothe lamp housing 150 via compliant conductors 154 positioned within thegap 151. While ten compliant conductors 154 are shown, it iscontemplated that more than 10 compliant conductors 154 may be utilized.The compliant conductors 154 facilitate heat removal from the lowerwindow 104, which further increases the rate of cooling of the substrate108 by reducing the radiation, conduction, and convection of heat fromthe lower window 104 to the substrate 108. Cooling channels 149 removeheat from the lamp housing 150 to facilitate cooling of the lamp housing150 and the lower window 104.

The lamps 142 are adapted to the heat the substrate to a predeterminedtemperature to facilitate thermal decomposition of the process gas ontothe surface of the substrate 108. In one example, the material depositedonto the substrate may be a group III, group IV, and/or group Vmaterial, or may be a material including a group III, group IV, and/orgroup V dopant. For example, the deposited material may include galliumarsenide, gallium nitride, or aluminum gallium nitride. The lamps may beadapted to heat the substrate to a temperature within a range of about300 degrees Celsius to about 1200 degrees Celsius, such as about 300degrees Celsius to about 950 degrees Celsius.

Although FIG. 1 illustrates one embodiment of a process chamber,additional embodiments are also contemplated. For example, in anotherembodiment, it is contemplated that the substrate support 106 may beformed from an optically transparent material, such as quartz, to allowfor direct heating of the substrate 108. In yet another embodiment, itis contemplated that an optional circular shield 139 may be disposedaround the substrate support 106 and coupled to a sidewall of thechamber body 101. In another embodiment, the process gas supply source132 may be adapted to supply multiple types of process gases, forexample, a group III precursor gas and a group V precursor gas. Themultiple process gases may be introduced into the chamber through thesame process gas inlet 134, or through different process gas inlets 134.Additionally, it is also contemplated that the size, width, and/ornumber of gas inlets 124, 134, or gas outlets 128, 138 may be adjustedto further facilitate a uniform deposition of material on the substrate108.

In another embodiment, the substrate support 106 may be an annular ringor edge ring having a central opening therethrough, and may be adaptedto support the perimeter of the substrate 108. In such an embodiment,the substrate support 106 may be formed from silicon carbide,silicon-carbide-coated graphite, or glassy-carbon-coated graphite. Inanother embodiment, the substrate support may be a three or more pinsupport that provides minimal conductive cooling.

FIG. 2 is an enlarged partial view of FIG. 1 illustrating the compliantconductors 154. In the embodiment shown in FIG. 2, the compliantconductors 154 have a “zig-zag” or “serpentine” shape. The compliantconductors 154 are positioned between and in contact with a lowersurface 104 a of the lower window 104 and an upper surface 150 a of thelamp housing 150. The lamp housing 150 is formed from a metal, such asstainless steel or copper, and can be formed to relatively exacttolerances using modern machining techniques, such as computer numericalcontrol (CNC) machining. Thus, the upper surface 150 a is relativelyplanar. In contrast, the lower surface 104 a of the lower window 104 isnot capable of be produced to as exact of tolerances as the lamp housing150 due to the difficulties of machining the material from which thelower window 104 is constructed. In one example, the lower surface 104 amay have as much as 1 millimeter difference in planarity, resulting inthe height of the gap 151 varying along the length of the lower window104. The difference in the height of the gap 151 can affect the heattransfer between the lower window 104 and the lamp housing 150 atdifferent locations, primarily due to the difference in conductionlength path across the gap 151.

To facilitate more uniform heat transfer, the compliant conductors 154are positioned between the lower window 104 and the lamp housing 150.The compliant conductors are in physical contact with the lower surface104 a of the lower window 104 and the upper surface 150 a of the lamphousing 150. The compliant conductors 154 transfer thermal energy fromthe lower window 104 to the lamp housing 150 via conduction, as opposedto convection or radiation that would otherwise occur in the absence ofthe compliant conductors 154. While some convective or radiating heattransfer may still occur even in the presence of the compliantconductors 154, the convective or radiating heat transfer is orders ofmagnitude smaller, and thus, generally negligible compared to theconductive heat transfer facilitated by the compliant conductors. In oneexample, the compliant conductors 154 are formed from copper and have avolume density of about 40 percent, and the gap 151 is filled withhelium. In such an example, the transfer of heat due to the compliantconductors 154 is more than 100 times the transfer of heat due toconvection or radiation. The relatively greater heat transfer of thecompliant conductors 154 is at least partially due to the higher thermalconductivity of the compliant conductor 154 compared to the gas in thegap 151.

The compliant conductors 154 are formed from a compliant material andhave substantially the same conduction length across the gap 151,regardless of the machining tolerances of the lower surface 104 a of thelower window 104. The “zig-zag” or serpentine shape of the compliantconductors 154 allow the compliant conductors 154 to expand and contractto remain in contact with the lower window 104 and the lamp housing 150.As illustrated in FIG. 2, both of the compliant conductors 154 shownhave the same overall conduction path, however, the compliant conductors154 are shown in different states of expansion in order to contact boththe lower window 104 and the lamp housing 150. The different states ofexpansion of the compliant conductors 154 are dictated by the lack ofplanarity of the lower surface 104 a, since the compliant conductors154, which are generally fixedly attached to the lamp housing 150,expand to contact the lower window 104. However, regardless of theexpansion state of the compliant conductors 154, the conduction pathlength of the compliant conductors 154 remains constant. Thus, heattransfer from the lower window 104 to the lamp housing 150 is consistentacross all locations of the gap 151 regardless of the varying dimensionsof the gap 151. Moreover, the conduction path is consistent fromchamber-to-chamber, irrespective of machining differences in chambercomponents of the individual chambers.

The compliant conductors 154 are formed from a material having a highthermal conductivity, including metals such as stainless steel, nickel,copper, iron, inconel, aluminum, or combinations thereof, and ceramicssuch as alumina, magnesia, aluminum nitride, zirconia, silica, andcombinations thereof. The compliant conductors 154 also optionallyinclude a coating 155 at least on a portion adjacent the lower surface104 a of the lower window 104. The coating 155 reduces undesiredscratching or marring of the lower window 104 due to contact with thecompliant conductors 154. The coating 155 may include glassy carbon,graphite, boron nitride, or mica. It is contemplated that the coating155 may be omitted in some embodiments. In such an embodiment, alubricant such as graphite, hexagonal boron nitride, or molybdenumdisulfide may be applied to the lower window 104 or the compliantconductors 154 to reduce scratching or marring of the lower window 104.The compliant conductors 154 are generally fixedly attached to the lamphousing 150, for example, by brazing or welding. Bonding of compliantconductors 154 including ceramic may be accomplished using a bondingagent including sodium silicate, ammonia silicate, aluminum phosphate,zinc phosphate, or other nano-dispersed suspensions.

FIG. 3 is a partial sectional schematic view of the lamp housing 150,according to one embodiment of the disclosure. The upper surface 150 aincludes features, such as openings 362, formed therein. The openings362 allow radiant energy from the lamps 142 to pass through the uppersurface 150 a to impinge upon a substrate or substrate support. Anopening 362 is disposed above each of the lamps 142. Between rows of theopenings 362, compliant conductors 154 are coupled to the upper surface150 a. The compliant conductors 154 are positioned such that radiantenergy from the lamps 142 is not blocked by the compliant conductors154. The compliant conductors 154 are arranged in annular rows, however,additional distributions are also contemplated. In addition, it iscontemplated that the spacing and density (compliant conductors 154 perarea) can also be adjusted to facilitate a predetermined amount of heattransfer form a lower window to the lamp housing 150. In one example,the compliant conductors 154 may cover about 40 percent of the uppersurface 150 a. In another example, the compliant conductors may have aspacing of about 2 millimeters to about 3 millimeters.

FIGS. 4A-4D illustrate compliant conductors according to otherembodiments of the disclosure. FIG. 4A illustrates a compliant conductor454 a formed from a wool. The wool may include any of the metal orceramic materials discussed above. The compliant conductor 454 a mayoptionally include a coating thereon (not shown for clarity), such ascoating 155 discussed with respect to FIG. 2, for reducing scratching ofa lower window. The compliant conductor 454 a may be coupled to a lamphousing in discrete patches or in strips.

FIG. 4B illustrates a compliant conductor 454 b. The compliant conductor454 b is a wire mesh. The wire mesh may include any of the metal orceramic materials discussed above. The compliant conductor 454 b mayoptionally include a coating thereon (not shown for clarity), such ascoating 155 discussed with respect to FIG. 2, for reducing scratching ofa lower window. The compliant conductor 454 b may be coupled to a lamphousing in discrete patches or in strips.

FIG. 4C illustrates a complaint conductor 454 c. The compliant conductor454 c is formed in a helical shape, and may be, for example, a springformed from a metal discussed above. A coating 155 is disposed on an endof the compliant conductor 454 c adapted to contact a lower window. FIG.4D illustrates a compliant conductor 454 d having an “S” shape. Thecompliant conductor 454 d also includes a coating 155 disposed on an endof the compliant conductor 454 c adapted to contact a lower window.

FIGS. 4A-4D illustrate compliant conductors according to someembodiments of the disclosure, however, additional shapes for compliantconductors are also contemplated. Additional shapes also include metalchainmail or batting, bubbled metal foil, folded metal foil leaves, andconnected metal foil tubes. In another embodiment, it is contemplatedthat the compliant conductors may be formed from any material sufficientto withstand a desired process temperature, such as about 300 degrees toabout 400 degrees Celsius, or greater. In another embodiment, thecoatings 155 may include siloxane polymers, polyimides, orpolytetrafluoroethylene.

In another embodiment, it is contemplated that compliant conductors,such as compliant conductors 454 a and 454 b, may be impregnated orcoated with one or more fluids or near-fluids, such as waxes, grease,and/or compliant polymers, to facilitate increased heat transfer. Insuch an embodiment, it is contemplated that the porosity and surfacetension of the compliant conductors may facilitate restriction of thefluids or near-fluids into undesired regions of the processing chamber.One example of compliant polymers may include silicone rubber or filledsilicones. A filled silicone, for example, may include particles ofthermally conducting material, such as metallic flakes, to increase heattransfer. In one embodiment, silicon rubber may have a thermalconductivity of about 1.3 W/mΩk.

Benefits of embodiments described herein include uniform cooling ofchamber components irrespective of machining tolerances of the chambercomponents. Thus, chamber-to-chamber temperature control is moreuniform, resulting in more uniform properties of substrates processed indifferent chambers.

While the foregoing is directed to embodiments of the presentdisclosure, other and further embodiments of the disclosure may bedevised without departing from the basic scope thereof, and the scopethereof is determined by the claims that follow.

What is claimed is:
 1. An apparatus to facilitate cooling, comprising: alamp housing comprising one or more of copper, aluminum, and stainlesssteel; a plurality of lamps disposed in the lamp housing, each lampcomprising a bulb and a reflector; and a plurality of compliantconductors coupled to an upper surface of the lamp housing, wherein eachof the compliant conductors includes a coating thereon.
 2. The apparatusof claim 1, wherein each of the compliant conductors has a substantiallyequal length.
 3. The apparatus of claim 2, wherein the compliantconductors comprise a ceramic.
 4. The apparatus of claim 1, wherein thecoating comprises glassy carbon, graphite, boron nitride, or mica. 5.The apparatus of claim 1, wherein the compliant conductors comprise aceramic.
 6. The apparatus of claim 5, wherein the ceramic comprisesalumina, magnesia, aluminum nitride, zirconia, silica, or combinationsthereof.
 7. The apparatus of claim 1, wherein the compliant conductorscomprise a metal.
 8. The apparatus of claim 7, wherein the metalcomprises stainless steel, nickel, copper, iron, inconel, aluminum, orcombinations thereof.
 9. The apparatus of claim 8, wherein the compliantconductors are welded to the lamp housing.
 10. The apparatus of claim 1,wherein the compliant conductors are mesh or wool comprising metal orceramic.
 11. The apparatus of claim 1, wherein the compliant conductorshave a serpentine shape.
 12. The apparatus of claim 1, wherein thecompliant conductors are shaped as a helical coil.
 13. An apparatus tofacilitate cooling, comprising: a lamp housing comprising one or more ofcopper, aluminum, and stainless steel; a plurality of lamps disposed inthe lamp housing, each lamp comprising a bulb and a reflector; and aplurality of compliant conductors coupled to an upper surface of thelamp housing, the compliant conductors including mesh or wool.
 14. Amethod of processing a substrate in a processing chamber, comprising:irradiating a substrate with thermal energy from a plurality of lampslocated in a lamp housing, the thermal energy irradiated through anoptically transparent window; and transferring heat from the opticallytransparent window to the lamp housing through a plurality of compliantconductors disposed within a gap between the lamp housing andtransparent window, the plurality of compliant conductors in contactwith the lamp housing and transparent window.
 15. The method of claim14, wherein each of the compliant conductors has a substantially equallength.
 16. The method of claim 15, wherein the compliant conductorscomprise a ceramic.
 17. The method of claim 14, wherein the coatingcomprises glassy carbon, graphite, boron nitride, or mica.
 18. Theapparatus of claim 14, wherein the compliant conductors comprise ametal.
 19. The apparatus of claim 18, wherein the metal comprisesstainless steel, nickel, copper, iron, inconel, aluminum, orcombinations thereof.
 20. The apparatus of claim 14, wherein thecompliant conductors are mesh or wool comprising metal or ceramic.